Photoresist stripping machine

PHOTO LITHOGRAPHYPHOTOLITHOGRAPHY

Photoresist stripping machine

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Photoresist stripping machine

Photoresist stripping machine

more

Individual process type stripping machine

Individual process type stripping machine

more

Immersion-type stripping machine

Immersion-type stripping machine

more

 

Photoresist stripping machine

Photoresist stripping machines remove unnecessary resist materials after printed substrates/ semiconductor wafers are finished patterning etching. This process is called photoresist stripping.

 

One example of photolithography process

One example of photolithography process

 

Photoresist stripping process can be conducted with two kinds of methods: “Dry process” uses plasma or ozone and “Wet process” uses alkaline aqueous solution or organic solvent such as organic amine (TMAH and the like) and ketone (acetone and the like).

 

NSC Engineering’s specialty is wet stripping process. From photoresist stripping machines to etching machines, we have fabrication records for integrated lines combining machines for the processes before and after photoresist stripping.

 

Following is one example from our machine supply records.

 

Individual process type stripping machine

Individual process type stripping machine

Features

This machine strips off photoresist films in individual process type.

 

Consistently integrated procedure from stripping to cleaning and drying can be performed through automatic operation.

 

NSC Engineering provides the suitable design according to the size of workpiece and resist stripper solution.

Specification examples in our machine supply records

Item
Fabrication record
Material of work
Glass
Thickness of work
2.1mm
Size of work
~460×460mm
Chemicals mainly used
Alkaline stripper solution
Standard delivery time
4 months
Safety measure
Interlocks at each spot
Operation system
Automatic operation
Control system
PLC control
System standard
JIS, Japanese Industrial Standard
 

Immersion-type stripping machine

Immersion-type stripping machine

Features

This machine stores small-sized workpieces such as chips to its cassette where photoresist films are removed through batch process.

 

A plural of workpieces can be processed all at once with various kinds of processing solution.

 

NSC Engineering provides the suitable design according to the size of workpiece and resist stripper solution.

Specification examples in our machine supply records

Item
Fabrication record
Material of work
Glass
Thickness of work
0.7mm
Size of work
Processing tank valid size 400 mm × 700 mm × H 300 mm
Chemicals mainly used
Alkaline aqueous solution, Organic alkaline stripper solution
Standard delivery time
2 months
Safety measure
Interlocks at each spot
Operation system
Manual operation
Control system
Relay control
System standard
JIS, Japanese Industrial Standard

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